Intel has teamed up with Japan's National Institute of Advanced Industrial Science and Technology (AIST) to create a pioneering chip manufacturing research and development center in Japan. This state-of-the-art facility will be the first in the country to host extreme ultraviolet (EUV) lithography equipment, crucial for producing advanced chipsets with dimensions of 5 nanometers or less.
Managed by AIST, which operates under Japan’s Ministry of Economy, Trade and Industry, the center will leverage Intel’s expertise in EUV chip manufacturing technology. This collaborative initiative will mark Japan's first domestic research institution equipped with EUV technology and will be available for use by chip manufacturers and materials companies for a fee.
The establishment of this R&D hub is set to enhance the capabilities of Japanese chip designers, allowing them to utilize cutting-edge process technologies and improve their global competitiveness. The EUV equipment, known for its high cost of approximately $200 million per unit, represents a significant investment in semiconductor innovation.
Currently, Japanese firms access EUV technology through international organizations such as Belgium’s Imec, a leading semiconductor research facility. Japanese semiconductor company Rapidus is also preparing to install Imec’s EUV technology in December.
The new facility, with an estimated construction timeline of three to five years and a budget running into hundreds of millions of dollars, is poised to be a transformative addition to Japan's semiconductor industry, underscoring the country's commitment to advancing its technological prowess in chip manufacturing.
